Perfil
Mr. Lamberto Raffaelli is President, CEO, Treasurer & Director at LNX Corp.
He is on the Board of Directors at LNX Corp.
Mr. Raffaelli also served on the board at Ibis Technology Corp.
Antiguos cargos conocidos de Lamberto Raffaelli.
Empresas | Cargo | Fin |
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Ibis Technology Corp.
Ibis Technology Corp. SemiconductorsElectronic Technology Ibis Technology Corp. develops, manufactures and markets SIMOX-SOI implantation equipment for the worldwide semiconductor industry. SIMOX creates an insulating oxide barrier below the top surface of a silicon wafer through implantation and annealing. The company's proprietary oxygen implanters produce SIMOX-SOI wafers by implanting oxygen atoms just below the surface of a silicon wafer to create a very thin layer of silicon dioxide between the thin operating region of the transistor at the surface and the underlying silicon wafer itself. It was founded in October 1987. | Director/Miembro de la Junta | 17/02/2009 |
LNX Corp.
LNX Corp. Electronic Production EquipmentElectronic Technology LNX Corp. was engaged in the design and manufacture of microwave and millimeter wave components. It manufactured military and commercial communications equipment. The firm’s products included applications in detection of coherent radar, signal detection, digitization, converter, switch and digital products. The company was founded in 2001 and was headquartered in Salem, NH. | Fundador | - |
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LNX Corp.
LNX Corp. Electronic Production EquipmentElectronic Technology LNX Corp. was engaged in the design and manufacture of microwave and millimeter wave components. It manufactured military and commercial communications equipment. The firm’s products included applications in detection of coherent radar, signal detection, digitization, converter, switch and digital products. The company was founded in 2001 and was headquartered in Salem, NH. | Electronic Technology |
Ibis Technology Corp.
Ibis Technology Corp. SemiconductorsElectronic Technology Ibis Technology Corp. develops, manufactures and markets SIMOX-SOI implantation equipment for the worldwide semiconductor industry. SIMOX creates an insulating oxide barrier below the top surface of a silicon wafer through implantation and annealing. The company's proprietary oxygen implanters produce SIMOX-SOI wafers by implanting oxygen atoms just below the surface of a silicon wafer to create a very thin layer of silicon dioxide between the thin operating region of the transistor at the surface and the underlying silicon wafer itself. It was founded in October 1987. | Electronic Technology |
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