Alexandra L. McClelland

Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom.

Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom.

Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom.

Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom.

Irresistible Materials Ltd. develops next generation of photo-resist materials the semiconductor industry. The firm's photo-resist is a material that undergoes a change in its physical and chemical properties upon exposure to radiation that allows for the formation of a relief pattern in a material. The company was founded by Elwyn Shelley, Alex Robinson and David Alexander Ure in 2010 and is headquartered in Swansea Waterfront, the United Kingdom.